Adam Hock obtained his B.S. in chemistry with Distinction at the University of Delaware in 2001 and his PhD in inorganic chemistry in 2007 at the Massachusetts Institute of Technology under the tutelage of Prof. Richard Schrock. As a member of the Schrock Group, Dr. Hock pursued fundamental organometallic chemistry research and extended it to develop a practical synthesis to a wide variety of olefin metathesis catalysts. Adam then joined Prof. Roy Gordon’s laboratory at Harvard University where he was a Camille and Henry Dreyfus Environmental Chemistry Fellow. His work with Prof. Gordon was directed at synthesizing earth-abundant, cost-effective photovoltaic (PV) materials. He also developed chemistry directed at other semiconductor applications such as low temperature deposition of the transparent conductor tin dioxide.
In 2010 Adam joined the Illinois Institute of Technology and Argonne National Laboratory as a joint Assistant Professor and Scientist. His independent research is as a synthetic chemist pursuing new chemical processes for semiconductor, catalysis, and energy problems. This includes developing novel atomic layer deposition (ALD) vapor precursors and chemistries, heterobimetallic catalysts, and fundamental chemical understanding of synthesis and catalysis processes. Current group projects include new ALD precursors for transition metal dichalcogenides, semiconducting and novel oxides, nitrides, selective electrocatalysis and electrochemical energy conversion, and new thermal catalysts for chemicals production.