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ASAP Industry Talk: Heilmeier Catechism with Dr. Melissa Smith from MITLL

Event Type
Webinar
Sponsor
Center for Advanced Semiconductor Chips with Accelerated Performance (ASAP)
Location
Virtual - Zoom
Date
Jul 22, 2024   11:00 am  
Speaker
Dr. Melissa Alyson Smith
Cost
No cost
Registration
Registration
Contact
Mallory Gorman
E-Mail
magorma2@illinois.edu
Views
5
Originating Calendar
Illinois ECE Calendar

Tips for Answering the Heilmeier Catechism for More Effective Proposals
Melissa Alyson Smith
Lincoln Laboratory, Massachusetts Institute of Technology
Lexington, MA  02421 

ABSTRACT - 
The Microelectronics (ME) Commons, funded by the CHIPS and Science Act, is a nationwide system of innovation hubs in the United States. The ME Commons, administered by the United States Department of Defense, aims to support the development of fundamental microelectronic research concepts and transition them to commercial production, or lab-to-fab transitions. Periodically, Calls for Projects will be released for the submission and evaluation of technical concepts to the ME Commons. A typical requirement for successful and compliant proposals to the United States Department of Defense, as is the case for the ME Commons, is to answer the Heilmeier Catechism.

This seminar will provide insights on how to best answer the Heilmeier Catechism. Context will be provided for each of the eight questions. Leveraging common project management tools such as risk matrices and stoplight charts, useful approaches for generating appropriate responses will be discussed. It is anticipated that using the techniques highlighted in this seminar will empower principal investigators with the confidence to efficiently create more successful proposals.

BIOGRAPHY - 
Dr. Melissa Alyson Smith is an assistant leader in the Advanced Materials and Microsystems Group, where she leads interdisciplinary teams that drive innovation in fields spanning computation, aerospace, optical systems, and bioengineering by applying micro- and nanofabrication techniques. In addition, she provides recommendations for internal technology investments by serving in leadership positions for basic and applied research portfolios. 

Prior to joining the Laboratory, Smith worked at IBM Microelectronics, where she developed processes for epitaxial thin films for the 14 nm CMOS technology node. She has additional industry experience in materials testing, characterization, and processing through internships at Deere & Company, 3M, and Xerox Corporation. Smith is an inventor of several patents, which has earned her recognition from IBM and MIT Lincoln Laboratory (Best Invention 2020). Designated as a promising early career engineer by the National Academy of Engineering, she was invited to the U.S. Frontiers of Engineering Symposium in 2020.

Smith received her PhD degree in materials science and engineering from MIT and her BS degree in materials science and engineering from the University of Illinois at Urbana-Champaign.

Register HERE to attend the ASAP Industry Talk: Heilmeier Catechism with Dr. Melissa Smith from MITLL. 

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