Plasma Enhanced Chemical Vapor Deposition for Coating Applications
Abstract: Atmospheric Pressure Plasma devices are an expanding area of research and commercial interest in the past decade for their ability to produce low gas temperature reactive species in a highly scalable manner. Applications of interest include wound sterilization, waste treatment, specialty chemical production, and coatings. Ongoing projects at the Center for Plasma-Materials Interaction have developed plasma enhanced chemical vapor deposition process at atmospheric pressure for the production of zirconia and silica based corrosion barrier and adhesion coatings. These materials are of interest to a variety of automotive, aerospace and structural industries looking to replace costly and hazardous wet chemical process with a process that may be implemented at the point of manufacture. Synthesis challenges will be discussed along with recent results demonstrating the viability of the processes.
Bio: Dr. David Eitan Barlaz is currently a Visiting Research Scientist at the Center for Plasma-Materials Interaction at the University of Illinois at Urbana-Champaign where he has worked since starting a postdoctoral research appointment in 2017. His time there has focused on materials characterization for low temperature plasma processes. He earned his PhD in Chemical Engineering at University of Illinois at Urbana-Champaign working with no emeritus Professor Edmund Seebauer working on detection and manipulation of atomic scale defects in titanium dioxide with the goal of improving the understanding of synthesis-structure relationships in semiconductor metal oxides of interest to the catalysis, sensor and integrated circuit industries. Dr. Barlaz is currently pursuing tenure track faculty appointments with research focused on materials design and advanced synthesis techniques.
